In the clean room of Intel Corporation's Fab D1X in Hillsboro, Oregon, Intel Fellow Mark Phillips briefs media on the company's High Numerical Aperture Extreme Ultraviolet lithography tool. The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system in the world. The machine will allow Intel Foundry to continue its pursuit of Moore's Law by creating for its customers powerful chips with ever-smaller transistors. (Credit: Intel Corporation)
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In the clean room of Intel Corporation's Fab D1X in Hillsboro, Oregon, Intel Fellow Mark Phillips br

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In the clean room of Intel Corporation's Fab D1X in Hillsboro, Oregon, Intel Fellow Mark Phillips briefs media on the company's High Numerical Aperture Extreme Ultraviolet lithography tool. The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system in the world. The machine will allow Intel Foundry to continue its pursuit of Moore's Law by creating for its customers powerful chips with ever-smaller transistors. (Credit: Intel Corporation)

NIKON CORPORATION NIKON Z 7 1/200s ƒ/9/2 ISO2500 30/1mm — More Exif data

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  • Date Time Original 2024-04-11 10:34:14
  • Date Time Digitized 2024-04-11 10:34:14