Installation is complete and calibration started on Intel's High Numerical Aperture Extreme Ultraviolet lithography tool in a clean room at Intel Corporation's Fab D1X in Hillsboro, Oregon, in April 2024. The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The machine will allow Intel Foundry to continue its pursuit of Moore's Law by creating for its customers powerful chips with ever-smaller transistors. (Credit: Intel Corporation)
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Installation is complete and calibration started on Intel's High Numerical Aperture Extreme Ultravio

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Installation is complete and calibration started on Intel's High Numerical Aperture Extreme Ultraviolet lithography tool in a clean room at Intel Corporation's Fab D1X in Hillsboro, Oregon, in April 2024. The 165-ton High NA EUV tool was built by ASML and is the first commercial lithography system of its kind in the world. The machine will allow Intel Foundry to continue its pursuit of Moore's Law by creating for its customers powerful chips with ever-smaller transistors. (Credit: Intel Corporation)

NIKON CORPORATION NIKON Z 7 1/200s ƒ/9/2 ISO2500 30/1mm — More Exif data

  • Manufacturer NIKON CORPORATION
  • Model NIKON Z 7
  • Exposure Time 1/200s
  • Aperture ƒ/9/2
  • ISO 2500
  • Focal Length 30/1mm
  • X Resolution 300/1 dpi
  • Y Resolution 300/1 dpi
  • Resolution Unit inches
  • Color Space Uncalibrated
  • Orientation Horizontal (normal)
  • Software Adobe Photoshop 25.6 (Windows)
  • Sensing Method One-chip color area
  • Scene Capture Type Standard
  • Gain Control Low gain up
  • Exposure Bias Value 0/1
  • Exposure Program Manual
  • Exposure Mode Manual
  • Metering Mode Multi-segment
  • Light Source Unknown
  • Flash No Flash
  • White Balance 1
  • Contrast Normal
  • Saturation Normal
  • Sharpness Normal
  • Exif Version 0231
  • Date Time Original 2024-04-11 11:03:10
  • Date Time Digitized 2024-04-11 11:03:10